Wholesale NiCrAlSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier |MPANANKARENA

Nickel Chromium Aluminum Silicon

NiCrAlSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made Featured Image

Famaritana fohy:

Sokajy	Alloy Sputtering Target
Formula simika	NiCrAlSi
fifehezan	Nickel Chromium Aluminum Silicon
fahadiovana	99,5%, 99,9%, 99,95%
endrika	Plates，Tsanganana tanjona，arc cathodes，Natao namboarina
Fizotry ny famokarana	Vacuum mitsonika
Habe misy	L≤1500mm, W≤200mm

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NiCrAlSi Sputtering lasibatra dia novokarin'ny Vacuum Melting, fanariana sy mafana fitsaboana mba hiantohana ny tsy miovaova avo, tsara habe sy ny fampisehoana tsara.

Noho ny fanoherana avo lenta, ny fihetsika manohitra ny harafesina tsara, ny fanoherana ny mari-pana ambony ary ny solderability, Nickel Chromium Aluminum Silicon alloy dia ampiasaina betsaka amin'ny fampiharana indostrialy maro, anisan'izany ny metallurgy, ny famokarana mekanika, ary ny fitaovana an-trano.

Rich Special Materials manokana amin'ny fanamboarana ny Sputtering Target ary afaka mamokatra Nickel Chromium Aluminum Silicon Sputtering Materials araka ny mpanjifa 'famaritana.Raha mila fanazavana fanampiny dia mifandraisa aminay.

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